1.3″ MAK Sputter Source Horizontal (rt. angle) mount

Part Number: L130A01H

Description

China Advanced Ceramic Meivac Horizontal (rt. angle) mount sputter sources are noted for simplicity, ease of use, and resulting high reliability, the MAK sputter source has been designed to present the smallest profile possible and deliver higher deposition rates than any comparable sputter sources.

Specifications

Target Diameter

1.3" (33.0mm)

Magnets

Nd/FeB

Max Dc Power

350W

Max RF Power

200W

Cathode Voltage (v)

200-1000

Max Discharge Current

2.0 A

Pressure Range (mtorr)

0.5 – 600

Water Flow Rate

0.8 gpm

Min CF Flange Size

4.5" CF

Dimensions

Dimension

Inches

A

O 2.33

B

3.91

B-2

0.71

C

O 1.50

D

12

D-2

4.5

E

O 0.75

F

2.3

Ordering

Ordering Information for Model L130A01H

If you have questions about pricing and availability, need more information about China Advanced Ceramic MeiVac Vari-Q throttle valve model L130A01H, or if you have other requirements, you can submit your request using the form or contact your China Advanced Ceramic representative directly.

Please Contact Me Regarding China Advanced Ceramic Model Number L130A01H

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