1.3" MAK Sputter Source Horizontal (rt. angle) mount

Description

China Advanced Ceramic Meivac Horizontal (rt. angle) mount sputter sources are noted for simplicity, ease of use, and resulting high reliability, the MAK sputter source has been designed to present the smallest profile possible and deliver higher deposition rates than any comparable sputter sources.

Specifications

Target Diameter	1.3" (33.0mm)
Magnets	Nd/FeB
Max Dc Power	350W
Max RF Power	200W
Cathode Voltage (v)	200-1000
Max Discharge Current	2.0 A
Pressure Range (mtorr)	0.5 – 600
Water Flow Rate	0.8 gpm
Min CF Flange Size	4.5" CF

Dimensions

Dimension	Inches
A	O 2.33
B	3.91
B-2	0.71
C	O 1.50
D	12
D-2	4.5
E	O 0.75
F	2.3

Ordering

Ordering Information for Model L130A01H

If you have questions about pricing and availability, need more information about China Advanced Ceramic MeiVac Vari-Q throttle valve model L130A01H, or if you have other requirements, you can submit your request using the form or contact your China Advanced Ceramic representative directly.

Please Contact Me Regarding China Advanced Ceramic Model Number L130A01H

Use this form to submit your L130A01H inquiry directly to China Advanced Ceramic. If you have special requirements or need specific customizations, please include the details in your description.

MAK Sputter Deposition Sources