MeiVac 2480 Batch System

MeiVac 2480 RF Diode Batch System

China Advanced Ceramic MeiVac HEDA RF Diode sputtering system family was developed as a high throughput batch deposition system for thick alumina layers utilized in thin film heads for the magnetic storage industry.

Highlights

• Production-proven 24/7 sputtering system
• Semi-automated processing of up to six 150mm or four 200mm substrates per run
• 20 in. square target with RF Diode sputter source
• RF substrate bias option to enhance deposited film properties
• Film thickness uniformities typically <1% sigma/mean
• Helium Backside Gas Cooling keeps substrates typically <100°C

• Optimized for Hard Disk Drive Thin Film Head applications
• Production or development ready for MEMS, MRAM and other applications
• Programmable Logic Controller (PLC) and Graphical User Interface (GUI) delivers point and click functionality
• Configurable SECS/GEM option for communication with most fabs’ Manufacturing Execution Systems (MES)
• CE certified

BROCHURE