MeiVac 602 Single-Wafer System

MeiVac Precision 602 – Single Wafer System

China Advanced Ceramic MeiVac 602 series sputtering system was developed as a high reliability, high uptime, expandable system platform for the deposition of thin alumina gap layers.

Highlights

• Production-proven 24/7 sputtering system
• Fully automated processing of up to 200mm substrates
• Film thickness uniformities typically <0.5% sigma/mean
• Helium Backside Gas Cooling keeps substrates typically <100°C
• RF Diode or Planar Magnetron sputter source options
• Available with multiple process chambers and load-locks

Optimized for Hard Disk Drive Thin Film Head applications

RF substrate bias option to enhance deposited film properties

Available for metal or reactive dielectric material deposition

Programmable Logic Controller (PLC) and Graphical User Interface (GUI) delivers point and click functionality

Configurable SECS/GEM option for communication with most fabs’ Manufacturing Execution Systems (MES)

CE certified