Regulates All Aspects of the Electron Beam Deposition Process
The programmable Genius deposition controller regulates all aspects of the electron beam deposition process. As well as controlling the high voltage and regulating the filament supply, the Genius also handles the magnet current supply to the coils of the electron beam evaporator.
All of the Genius functions are included on the remote control which can be used to manually set and control the evaporation process as well as to set all process and system parameters.
Access to the menu functions may be limited with three password protected user levels.
In order to achieve the best in film quality and uniform evaporant utilization, the Genius can store a wide variety of evaporation parameters. Different data sets can then be applied to different phases of the process (eg. material melting and various coating phases). In addition to storing various beam sweep parameters, different high voltage values may also be set.
The Genius, when used with a Carrera series power supply, allows up to three electron beam sources to be run from a single power supply.
There are 2 Configurations:
Sequential Deposition
A filament switch card can be fitted to the Genius, enabling selection and deposition from one of several evaporators within the vacuum chamber. In this configuration, each evaporator requires a dedicated filament power supply.
Simultaneous Deposition
For simultaneous evaporation from several electron beam evaporators, each source is driven by its own individual Genius unit. In this configuration, the evaporators can be powered from a single Carrera high voltage power supply because the emission current is directly recorded by the filament power supply FPS-II.
